纳米压印 Nanoimprint lithography
2015-04-14 12:48:44    点击:

设备名称:纳米压印

规格型号: Eitre 6,Obducat

设备位置:Bay N2

设备描述:此设备采用了专利的气压软压技术、IPS技术和STU技术。压印制程分两个阶段,第一阶段是将硬质模板上的图案转移到中间聚合物软模板上,第二阶段是同时利用加热和UV固化将软模板上的图形转移到最终的衬底上。此压印工艺可实现6英寸大面积小至50nm图案的复制和转移。

工艺能力:

•  最高温度:200℃ 

•  最大压力:70 Bar 

•  LED UV 波长/光强: 365±10nm/ 35~45 mW/cm2

•  样品尺寸:最大 6 英寸 

•  衬底/模板厚度:最大2mm 

•  对准精度:±1μm 

•  残胶厚度:< 20nm


 

Equipment name: Nanoimprint lithography

Model/Vendor: Eitre 6,Obducat

Location:Bay N2

Description:

This equipment adopts the patented soft press、Intermediate Polymer Stamp、Simultaneous Thermal and UV Imprint technology. The imprint process contains two steps, the first step is inversing hard stamp pattern into an IPS, the second step is STU imprint process on final substrate. The equipment can imprint 6 inch full area of as small as 50nm pattern 。

Capability :

•  Max Temperature:200℃ 

•  Max Pressure:70bar 

•  LED UV Wavelength/Light Power:365±10nm/35~45 mW /cm2

•  Sample size:max 6 inch

•  Stamp/Substrate Thickness :max 2mm 

•  Alignment accuracy:±1μm 

•  Residual layer thickness:< 20nm